| 摘要 |
PROBLEM TO BE SOLVED: To provide a reflective mask having good positional accuracy quality in the vicinity of a light shielding region, and a method of manufacturing the same.SOLUTION: This reflective mask includes a multilayer reflection layer formed on the surface of a substrate, and an absorption layer formed on the multilayer reflection layer and having a circuit pattern. The light shielding region from which the absorption layer and the multilayer reflection layer are removed is formed on the outside of the region of the circuit pattern, and the reflective mask has a region to which a stress reducing treatment is applied in the multilayer reflection layer in the vicinity of the light shielding region formed on the multilayer reflection layer. |
