| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor substrate and a process of manufacturing the same, capable of reducing cost when setting an optimum exposure condition for a semiconductor substrate of low reflectance such as GaN.SOLUTION: The semiconductor substrate having a reflectance lower than a reflectance of a silicon substrate for light of a specific wavelength includes; a silicon substrate 20; and a dielectric film 10 which is formed on the silicon substrate, and whose refractive index for light of a wavelength of 405 nm is 2.75 or higher and 3.20 or lower. The dielectric film 10 is deposited on the Si substrate 20 by using ECR sputter, for instance. |
