发明名称 GRAPHENE WIRING
摘要 PROBLEM TO BE SOLVED: To provide low-resistance graphene wiring which can be used as wiring of a semiconductor element and prevents the graphene wiring from becoming a semiconductor and dispersing.SOLUTION: Graphene wiring 10 connected to a contact plug 2 formed in a conductive film 1 and a contact layer insulating film 3 is formed. The graphene wiring is formed of a catalyst foundation layer 11, a catalyst layer 12, and a graphene layer 13. The graphene layer is formed of a multi-layer graphene sheet formed of a single layer or 100 or less layers. The graphene layer comprises a dopant layer 14 on a side surface, and atoms or molecules exist between layers or on the layers of the graphene layer.
申请公布号 JP2014183210(A) 申请公布日期 2014.09.29
申请号 JP20130057004 申请日期 2013.03.19
申请人 TOSHIBA CORP 发明人 MIYAZAKI HISAO;SAKAI TADASHI;KATAGIRI MASAYUKI;YAMAZAKI YUICHI;SAKUMA HISASHI;SUZUKI MARIKO
分类号 H01L21/3205;C01B31/02;C23C16/26;H01B5/14;H01L21/28;H01L21/768;H01L23/532 主分类号 H01L21/3205
代理机构 代理人
主权项
地址