METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

摘要

The present invention forms a thin film having low permittivity and high etching resistance. A method for manufacturing a semiconductor device comprises: forming a thin film on a substrate; removing first impurities containing water and chlorine from the thin film by heat-treating the thin film at a first temperature higher than the temperature of the thin film in the process of forming the thin film; and removing second impurities containing hydrocarbon compounds from the thin film heat-treated at the first temperature by heat-treating the thin film at a second temperature higher than the first temperature.