ION IMPLANTATION APPARATUS AND FILM FORMATION APPARATUS

摘要

Provided is an ion implantation apparatus which is able to improve productivity by increasing throughput. The ion implantation apparatus (1) comprises vacuum chambers (12-18) aligned in order; a return unit (22) arranged in the vacuum chambers (12-18), while returning an object to be returned which comprising a substrate in the direction of the vacuum chambers (12-18) aligned; an ion source (20) installed on the vacuum chamber (16) while irradiating an ion beam toward the substrate; an unloading unit (24) installed on a vacuum chamber (12); and a loading unit (36) installed on a vacuum chamber (18). The unloading unit (24) unloads one tray among a loaded body (S1) in which multiple trays (201-203) are loaded, and returns the tray to the vacuum chamber (16) by the returning unit (22). The loading unit (26) loads a tray returned from the vacuum chamber (16) several times to form a new loaded body (S2).