APPARATUS AND METHOD FOR ESTIMATING THE DEPTH OF THE BURIED DEFECT IN THE SUBSTRATE

摘要

Provided are an apparatus and a method for estimating a depth of a buried defect in a substrate. The apparatus for estimating a depth of a buried defect in a substrate includes a light source providing a source of light; an aperture through which only a part of the source of light passes; a reflecting mirror receiving and reflecting the source of light that has passed through the aperture as a first light; a lens receiving and condensing the first light; the substrate receiving and reflecting the condensed first light as a second light; a light sensor receiving the second light and sensing a brightness of the second light; and a position adjustment portion adjusting a distance between the lens and the substrate.