发明名称 METHODS OF NONDESTRUCTIVELY DELAMINATING GRAPHENE FROM A METAL SUBSTRATE
摘要 <p>Methods of delaminating a graphene film (60) from a metal substrate (50) are disclosed that substantially preserve the metal substrate. The methods include forming a support layer (80) on the graphene film and then performing an electrochemical process in an electrochemical apparatus (10). The electrochemical process creates gas bubbles (36) at the metal-film interface (64), thereby causing the delamination. The graphene film and support layer form a structure (86) that is collected by a take-up roller (120). The support layer and graphene structure are then separated to obtain the graphene film.</p>
申请公布号 SG11201400465U(A) 申请公布日期 2014.09.26
申请号 SG11201400465U 申请日期 2012.09.04
申请人 NATIONAL UNIVERSITY OF SINGAPORE 发明人 LOH, KIAN PING;WANG, YU
分类号 C01B31/02;C25B1/04 主分类号 C01B31/02
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