DEVICE AND METHOD FOR PROCESSING SUBSTRATE

摘要

The present invention is to instantly dry the liquid on the surface during drying of a substrate and to improve the productivity of the substrate. A substrate processing apparatus (100) comprises: a cleaning liquid supply unit (114) for supplying a cleaning liquid to a surface of a substrate (W); a solvent supply unit (115) for supplying a volatile solvent to the surface of the substrate (W), in which the cleaning liquid is supplied, to substitute the cleaning liquid on the surface of the substrate (W) with the volatile solvent; a heating means (117) for heating the substrate (W) in which the volatile solvent is supplied; and a drying means (118) for drying the surface of the substrate (W) by removing the droplets of the volatile solvent generated on the surface of the substrate (W) by the heating operation due to the heating means (117). The heating means (117) and the drying means (118) are provided in the course of returning the substrate (W) taken out from the solvent supply unit (115).