发明名称 APPARATUS AND METHOD FOR SPECKLE REDUCTION IN LASER PROCESSING EQUIPMENT
摘要 Embodiments described herein provide apparatus and methods for processing semiconductor substrates with uniform laser energy. A laser pulse or beam is directed to a spatial homogenizer, which may be a plurality of lenses arranged along a plane perpendicular to the optical path of the laser energy, an example being a microlens array. The spatially uniformized energy produced by the spatial homogenizer is then directed to a refractive medium that has a plurality of thicknesses. Each thickness of the plurality of thicknesses is different from the other thicknesses by at least the coherence length of the laser energy.
申请公布号 SG2014010763(A) 申请公布日期 2014.09.26
申请号 SG20140010763 申请日期 2012.09.26
申请人 APPLIED MATERIALS, INC. 发明人 MOFFATT, STEPHEN
分类号 H01L21/268;H01L21/26 主分类号 H01L21/268
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