发明名称 |
POLISHING COMPOSITION, MANUFACTURING PROCESS THEREFOR, PROCESS FOR PRODUCTION OF SILICON SUBSTRATE, AND SILICON SUBSTRATE |
摘要 |
<p>A polishing composition is composed of a filtered diluted liquid obtained through an undiluted liquid-preparing step, an undiluted liquid-filtering step, a diluting step, and a diluted liquid-filtering step. In the undiluted liquid-preparing step, an undiluted liquid is prepared by mixing raw materials for the polishing composition. In the undiluted liquid-filtering step, the undiluted liquid is filtered. In the diluting step, the filtered undiluted liquid is diluted to obtain a diluted liquid. In the diluted liquid-filtering step, the diluted liquid is filtered. The polishing composition is used, for example, for polishing a silicon substrate material to produce a silicon substrate.</p> |
申请公布号 |
SG11201404047Q(A) |
申请公布日期 |
2014.09.26 |
申请号 |
SG11201404047Q |
申请日期 |
2013.01.16 |
申请人 |
FUJIMI INCORPORATED |
发明人 |
TAKAHASHI, SHUHEI;TSUCHIYA, KOHSUKE;TAKAMI, SHINICHIRO;MORI, YOSHIO |
分类号 |
H01L21/304;B24B37/00;C09K3/14 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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