发明名称 EJECTION INSPECTION DEVICE AND SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To determine whether or not the ejection action at each of a plurality of ejection openings is favorable with a high degree of accuracy.SOLUTION: An ejection inspection part 5 of a substrate processing device 1 comprises: a light emission part 51; and an imaging part 52. The light emission part 51 emits the light along a predetermined light present surface, and process liquid ejected from a plurality of ejection openings of an ejection head 31 is irradiated with the light. The imaging part 52 images the process liquid through which the planar light 510 from the light emission part 51 passes, and acquires an inspection image including a plurality of bright points. At the ejection inspection part 5, a plurality of normal ejection determination frame corresponding to a plurality of ejection openings on the inspection image are set by a determination frame setting part. The determination part acquires a presence/absence information of the bright point in each of normal ejection determination frames, and determines whether or not the ejection action at ejection openings corresponding to each normal ejection determination frames is favorable on the basis of the presence/absence information. Thereby it is possible to determine whether or not the ejection action at each of a plurality of ejection openings is favorable with a high degree of accuracy.
申请公布号 JP2014179449(A) 申请公布日期 2014.09.25
申请号 JP20130052192 申请日期 2013.03.14
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 FURUKAWA ITARU;SANO HIROSHI
分类号 H01L21/304;B05C5/00;B05C11/00;B05C11/08 主分类号 H01L21/304
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