发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To highly precisely measure a position of a fine movement stage on a coarse fine movement stage.SOLUTION: In measurement of positional information in an XY plane of a fine movement stage WFS held by a coarse movement stage WCS, an encoder system is used, the encoder system including a head which is placed facing a grating RG placed on a surface substantially parallel to the XY plane of the fine movement stage and irradiates a measurement beam on the grating. Then, the fine movement stage is driven individually or integrally with the coarse movement stage by a drive system, on the basis of the positional information measured by the encoder system. In this case, the head of the encoder system can be placed in proximity to the fine movement stage (the grating), thereby, highly precise measurement of the positional information of the fine movement stage by the encoder system can be performed.</p>
申请公布号 JP2014179633(A) 申请公布日期 2014.09.25
申请号 JP20140090780 申请日期 2014.04.25
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 H01L21/027;G01B11/00;G03F7/20;H01L21/68 主分类号 H01L21/027
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