HIGH RELIABILITY ETCHED-FACET PHOTONIC DEVICES

摘要

Semiconductor photonic device surfaces are covered with a dielectric or a metal protective layer. The protective layer covers the entire device, including regions near facets at active regions, to prevent bare or unprotected semiconductor regions, thereby to form a very high reliability etched facet photonic device.

主权项

1. A process for fabricating a photonic device, comprising:
forming on a top surface of a substrate a semiconductor structure comprising an active layer; dry etching said semiconductor structure to form a laser having at least one facet; covering said laser and said at least one facet with a protective layer; opening a contact window in said protective layer; and depositing a metal layer to cover said contact window and to electrically contact said laser.