| 摘要 |
<p>The present invention provides a liquid discharge device and a head cleaning method, with which nozzle discharge failure in liquid discharge heads can be inhibited, and discharge properties can be improved. A liquid discharge device (10) according to one embodiment of the present invention is provided with: a determination means (412) for determining whether cleaning is to be performed immediately after an image has been formed by liquid discharge heads (72M, 72K, 72C, 72Y); and a cleaning control means (412) for controlling cleaning operations in which a wiping member (192) is used. The cleaning control means is provided with: a function for implementing, in cases when cleaning is to be performed immediately after image formation, cleaning using a first cleaning mode in which, prior to performing wiping using the wiping member (192), a pre-wiping preparation operation in which a nozzle mechanism is made to vibrate is performed, and wiping using the wiping member is performed after the pre-wiping preparation operation has been performed; and a function for implementing, in cases when it is determined that cleaning immediately after image formation is not appropriate, cleaning using a second cleaning mode in which the pre-wiping preparation operation is omitted and wiping using the wiping member is performed.</p> |
