发明名称 POLYMERIZATION METHOD USING SURFACTANT-CONTAINING PARTICLE
摘要 An object of the present invention is to provide a method which can simply suppress fouling in a reactor and, according to the present invention, there is provided a method of polymerizing addition polymerizable monomers using a catalyst formed by bringing (A) a transition metal compound represented by the following general formula [3] or μ-oxo type transition metal compound dimer thereof and (B) an activating agent into contact with one another, the method comprising polymerizing addition polymerizable monomers in a solvent to which a surfactant-containing particle obtained by mixing a particle composed of an inorganic compound or an organic polymer, and at least one surfactant selected from the group consisting of a compound represented by the following general formula [1] and a compound represented by general formula [2] has been added.;R1—O—(—R2—O—)m-Q1  [1];R1′C(═O)NR52  [2];L1aM2X1b  [3]
申请公布号 US2014288251(A1) 申请公布日期 2014.09.25
申请号 US201214356497 申请日期 2012.12.06
申请人 Sumitomo Chemical Company, Limited 发明人 Ochi Naoko;Tamura Shinyo
分类号 C08F4/76;C08F4/52 主分类号 C08F4/76
代理机构 代理人
主权项 1. A method of polymerizing addition polymerizable monomers using a catalyst formed by bringing (A) a transition metal compound represented by the following general formula [3] or a t-oxo type transition metal compound dimer thereof, and (B) an activating agent into contact with one another, the method comprising polymerizing addition polymerizable monomers in a solvent to which a surfactant-containing particle obtained by mixing a particle composed of an inorganic compound or an organic polymer, and at least one surfactant selected from the group consisting of a compound represented by the following general formula [1] and a compound represented by general formula [2] has been added, R1—O—(—R2—O—)m-Q1  [1] R1′C(═O)NR52  [2]wherein, in the general formulas [1] and [2], R1 and R1′ represent a hydrocarbyl group having 1 to 30 carbon atoms and optionally having a substituent, R2 represents an alkylene group having 1 to 20 carbon atoms and optionally having a substituent, m represents a number of 1 to 100, when there are more than one R2, they may be the same or different from each other, Q1 represents a hydrogen atom, —C(═O)OM1, —R3—C(═O)OM1, —S(═O)2OM1, —R3—S(═O)2OM1, —P(═O)(OH)(OM1), —R3—P(═OH)(OH)(OM1), —P(═O)(OR4)OM1), —R3—P(═O)(OR4)(OM1), —P(═O)(OM1)2, or —R3—P(═O)(OM1)2, M1 represents a hydrogen atom, NH4, NH(R12OH)3 or an alkali metal atom, when there are more than one M1, they may be the same or different from each other, R3 represents an alkylene group having 1 to 20 carbon atoms and optionally having a substituent, R4 represents a hydrocarbyl group having 1 to 20 carbon atoms and optionally having a substituent, R12 represents an alkylene group having 1 to 20 carbon atoms and optionally having a substituent, R12 groups may be the same or different from each other, R5 represents a hydrogen atom, or a hydrocarbyl group having 1 to 30 carbon atoms and optionally having a substituent and R5 groups may be the same or different from each other, L1aM2X1b  [3]wherein M2 is a transition metal atom of Group 4 of the Periodic Table, L1 is a group having a cyclopentadienide frame or a group containing a hetero atom, when there are more than one L1, one L1 may be linked to another L1 either directly or via a residue containing a carbon atom, a silicon atom, a nitrogen atom, an oxygen atom, a sulfur atom or a phosphorus atom, X1 is a halogen atom, a hydrocarbyl group other than groups having a cyclopentadienide frame, or a hydrocarbyloxy group, and, a represents a number satisfying 0<a≦3, and b represents a number satisfying 0<b≦3.
地址 Tokyo JP