| 摘要 |
Provided are a PVD processing device (1) and method that can form a composite coating that has superior uniformity in a film thickness in the circumferential direction on the peripheral surface of a base material by rotation and orbital motion of the base material. The PVD processing device (1) is provided with: a vacuum chamber; an orbital motion table that gives orbital motion to a plurality of base materials (W) around an axis (7) of orbital motion inside the vacuum chamber; rotating tables (4) that rotate the base materials (W) around axes (8) of rotation that are parallel to the axis (7) of orbital motion on the orbital motion table; plural types of targets (5) provided in positions separated from each other in the circumferential direction on the outside in the radial direction of the orbital motion table; and a table rotating mechanism (6) that rotates the rotating tables (4) across an angle of 180° or more while the base materials (W) pass between two tangent lines (L1, L2) drawn from the center of the targets (5) to an arc enveloping the rotating tables (4). |
