| 摘要 |
PROBLEM TO BE SOLVED: To form a pattern that cannot be formed with a single negative pattern.SOLUTION: A patterning process comprises: applying a first resist material on a substrate to be processed, the first resist material comprising a resin which has a repeating unit including an acid labile group and is converted into insoluble with an organic solvent developer by elimination of the acid labile group, a photoacid generator, and a first organic solvent, prebaking the resist film to remove an unnecessary solvent, exposing the resist film to a high energy beam for patterning, heating developing with the organic solvent developer to obtain a first negative pattern; heating the first negative pattern to impart durability against a second organic solvent to be used for a second resist material; and applying the second resist material, prebaking, exposing, post-exposure baking, and developing with an organic solvent to form a second negative pattern different from the first negative pattern. Thus, the negative pattern of the first resist material and the negative pattern of the second resist material are simultaneously formed. |
