RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

摘要

A resist composition contains a high-molecular weight compound which has a partial structure represented by a general formula (a0-r-1) and has a constituent unit represented by a general formula (a0-1). In the formula (a0-r-1), Y1 represents a divalent linking group; each of R2 and R3 represents a group having 0 to 20 carbon atoms, which is not a fluorine atom, and either R2 or R3 may form a ring with Y1; m represents an integer of 1 or more; and Mm+ represents an m-valent organic cation. In the formula (a0-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, chain alkyl group or chain alkenyl group.

主权项

1. A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of the acid, comprising:
a partial structure represented by the following general formula (a0-r-1); and a base material component (A) which exhibits changed solubility in a developing solution by the action of an acid, wherein the base material component (A) contains a high-molecular weight compound having a constituent unit (a0) represented by the following general formula (a0-1): wherein in the formula (a0-r-1), Y1 represents a divalent linking group; each of R2 and R3 independently represents a group having 0 to 20 carbon atoms, which is not a fluorine atom, and either R2 or R3 may form a ring with Y1; m represents an integer of 1 or more; Mm+ represents an m-valent organic cation; and * represents a bond (and has the same usage below), and in the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, an optionally substituted chain alkyl group, or an optionally substituted chain alkenyl group.