| 摘要 |
PROBLEM TO BE SOLVED: To separate a chamber space from a processing liquid supply unit.SOLUTION: In a substrate processing apparatus 1, a cup part 161 forming a side space 160 in an outer periphery of a chamber 12 contacts with a chamber lid part 122 separated from a chamber body 121 so as to form an extended sealed space 100. A scan nozzle 188 is attached to the cup part 161 in the side space 160, and moving upward of the substrate 9 through an annular opening 81 so as to supply chemical solution onto a substrate 9. When the substrate 9 is in a washing process and a drying process, the scan nozzle 188 is housed in the side space 160, and the chamber lid part 122 closes an upper opening of the chamber body 121 so that the chamber space 120 is separated from the side space 160 and sealed. Accordingly, the chamber space 120 can be separated from the scan nozzle 188. Consequently, the substrate 9 can be protected from splashing chemical liquid mist coming from the scan nozzle 188. |
