发明名称 METHOD OF FILLING THROUGH-HOLES
摘要 <p>PROBLEM TO BE SOLVED: To inhibit or reduce dimpling and voids during copper electroplating of through-holes with flash copper layers in substrates such as printed circuit boards.SOLUTION: An aqueous acid solution containing 50 ppb to 10 ppm of disulfide compounds is applied to the through-holes of the substrate, and then the through-holes are filled with copper using an acid copper electroplating bath which includes additives such as brighteners and levelers. (X is sodium, potassium or hydrogen, R is independently hydrogen or alkyl, and n and m are integers equal to or greater than 1.)</p>
申请公布号 JP2014177704(A) 申请公布日期 2014.09.25
申请号 JP20140051819 申请日期 2014.03.14
申请人 ROHM & HAAS ELECTRONIC MATERIALS LLC 发明人 NAGARAJAN JAYARAJU;ELIE H NAJJAR;BARSTAD LEON R
分类号 C25D7/00;C25D3/38;C25D5/34 主分类号 C25D7/00
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