发明名称 |
METHOD OF FILLING THROUGH-HOLES |
摘要 |
<p>PROBLEM TO BE SOLVED: To inhibit or reduce dimpling and voids during copper electroplating of through-holes with flash copper layers in substrates such as printed circuit boards.SOLUTION: An aqueous acid solution containing 50 ppb to 10 ppm of disulfide compounds is applied to the through-holes of the substrate, and then the through-holes are filled with copper using an acid copper electroplating bath which includes additives such as brighteners and levelers. (X is sodium, potassium or hydrogen, R is independently hydrogen or alkyl, and n and m are integers equal to or greater than 1.)</p> |
申请公布号 |
JP2014177704(A) |
申请公布日期 |
2014.09.25 |
申请号 |
JP20140051819 |
申请日期 |
2014.03.14 |
申请人 |
ROHM & HAAS ELECTRONIC MATERIALS LLC |
发明人 |
NAGARAJAN JAYARAJU;ELIE H NAJJAR;BARSTAD LEON R |
分类号 |
C25D7/00;C25D3/38;C25D5/34 |
主分类号 |
C25D7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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