| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method that may produce a nonmagnetic Mo alloy sputtering target material of low resistance, superior in heat resistance, humidity resistance and adhesion to a substrate, high density and high purity suitable for an electrode and wiring thin film stably and at low cost and a novel Mo alloy sputtering target material.SOLUTION: Mo powder and at least one or two kinds of Ni alloy powder are mixed to contain 10 to 49 atom% of Ni and 1 to 30 atom% of Ti and to satisfy the composition in which a total amount of Ni and Ti is 50 atom% or less and the balance is Mo and inevitable impurities and then the mixture is pressed and sintered. A Mo alloy sputtering target material contains 10 to 49 atom% of Ni and 1 to 30 atom% of Ti, in which a total amount of Ni and Ti is 50 atom% or less and the balance is Mo and inevitable impurities and has a structure in which a Ni alloy phase is dispersed in the Mo matrix. |
