MEASUREMENT METHOD AND POSITION ADJUSTMENT METHOD

摘要

PROBLEM TO BE SOLVED: To relatively simply and quickly measure the defocus amounts of the measurement position of a surface to be inspected.SOLUTION: A measurement method for measuring defocus amounts as deviation amounts in an optical axial direction from the focal position of an imaging optical system 104 at the measurement position of a surface to be inspected includes: acquiring an evaluation value on the basis of the image of a mask 103 formed by the imaging optical system; and acquiring the defocus amounts corresponding to the evaluation value by using preliminarily acquired relation between the defocus amounts and evaluation value. The mask includes: first regions 35 and 36 having a first phase; and second regions 37 and 38 having a second phase different from the first phase. The evaluation value is acquired on the basis of a first value indicative of the imaging state of an image corresponding to the first regions and a second value indicative of the imaging state of the image corresponding to the second regions.