发明名称 |
A 193NM LASER AND AN INSPECTION SYSTEM USING A 193NM LASER |
摘要 |
An improved laser uses a pump laser with a wavelength near 1109 nm and a fundamental wavelength near 1171 nm to generate light at a wavelength between approximately 189 nm and approximately 200 nm, e.g. 193 nm. The laser mixes the 1109 nm pump wavelength with the 5th harmonic of the 1171 nm fundamental, which is at a wavelength of approximately 234.2 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability. |
申请公布号 |
WO2014153328(A1) |
申请公布日期 |
2014.09.25 |
申请号 |
WO2014US30989 |
申请日期 |
2014.03.18 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
CHUANG, YUNG-HO;ARMSTRONG, J. JOSEPH;LIOU, JUSTIN DIANHUAN;DRIBINSKI, VLADIMIR;FIELDEN, JOHN |
分类号 |
H01S3/10;H01S3/109 |
主分类号 |
H01S3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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