发明名称 |
METAL ALUMINUM NITRIDE EMBEDDED RESISTORS FOR RESISTIVE RANDOM MEMORY ACCESS CELLS |
摘要 |
<p>Provided are resistive random access memory (ReRAM) cells and methods of fabricating thereof. A ReRAM cell includes an embedded resistor and resistive switching layer connected in series. The embedded resistor prevents excessive electrical currents through the resistive switching layer, especially when the resistive switching layer is switched into its low resistive state, thereby preventing over-programming. The embedded resistor includes aluminum, nitrogen, and one or more additional metals (other than aluminum). The concentration of each component is controlled to achieve desired resistivity and stability of the embedded resistor. In some embodiments, the resistivity ranges from 0.1 Ohm-centimeter to 40 Ohm- centimeter and remains substantially constant while applying an electrical field of up 8 mega-Volts /centimeter to the embedded resistor. The embedded resistor may be made from an amorphous material, and the material is operable to remain amorphous even when subjected to typical annealing conditions.</p> |
申请公布号 |
WO2014150985(A1) |
申请公布日期 |
2014.09.25 |
申请号 |
WO2014US24707 |
申请日期 |
2014.03.12 |
申请人 |
KABUSHIKI KAISHA TOSHIBA;SANDISK 3D LLC;INTERMOLECULAR, INC. |
发明人 |
TENDULKAR, MIHIR;HIGUCHI, RANDALL;HSUEH, CHIEN-LAN |
分类号 |
H01L45/00;H01L27/24 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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