SUBSTRATE CLEANING AND DRYING METHOD AND SUBSTRATE DEVELOPING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate cleaning and drying method and a substrate developing method, capable of drying a substrate in a short time.SOLUTION: A substrate cleaning and drying method comprises the steps of: supplying a cleaning liquid C to a substrate W after development and cleaning the substrate W (cleaning step); putting the cleaning liquid C on the substrate W (putting step); thinning the film thickness of the cleaning liquid C put on the substrate W (film thinning step); and forming an outdoor airflow covering an upper part of the substrate W and an indoor airflow for moving the cleaning liquid C on the substrate W between the outdoor airflow and the substrate W by rotating the substrate W (drying step).