| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin-film deposition apparatus that is easily applicable to a large-size substrate mass production process and improved in manufacture yield.SOLUTION: A thin-film deposition apparatus includes: a vapor deposition source which radiates a vapor deposition substance; a first nozzle which is arranged on one side of the vapor deposition source and has a plurality of first slits formed along a first direction; a second nozzle which is arranged opposite to the first nozzle and has a plurality of second slits formed along the first direction; and a shield wall assembly which is arranged between the first nozzle and the second nozzle along the first direction, and has a plurality of shield walls partitioning the space between the first nozzle and second nozzle into a plurality of vapor deposition spaces. |
