发明名称 SOLID-STATE IMAGING DEVICE
摘要 A solid-state imaging device includes a pixel chip, a logic chip and one or more shielding layers. The one or more shielding layers are arranged between or within the pixel chip and/or the logic chip to shield or reduce the effect of electromagnetic interference, radiation generated noise, or electromagnetic waves generated in one portion of the solid-state imaging device from affecting another portion of the solid-state imaging device.
申请公布号 US2014284745(A1) 申请公布日期 2014.09.25
申请号 US201314016003 申请日期 2013.08.30
申请人 Kabushiki Kaisha Toshiba 发明人 SETA Shoji
分类号 H01L27/146;H01L23/552 主分类号 H01L27/146
代理机构 代理人
主权项 1. A solid-state imaging device, comprising: a first multilayered wiring layer formed over a transistor which is formed on a semiconductor substrate, wherein the first multilayered wiring layer comprises: a first interlayer insulation film;a plurality of first wiring layers; anda plurality of wiring vias, which interconnect the plurality of first wiring layers disposed within the first interlayer insulation film; a first shield layer formed within the first interlayer insulation film; a second shield layer formed within the first interlayer insulation film and between two or more of the wiring vias; an imaging element; and a second multilayered wiring layer disposed between the imaging element and the first multilayered wiring layer, wherein the second multilayered wiring layer comprises a second interlayer insulation film, which is disposed on the first interlayer insulation film, and a plurality of second wiring layers that are disposed within the second interlayer insulation film.
地址 Tokyo JP