| 摘要 |
The invention is directed to a method and an apparatus for stabilizing the source location during the generation of EUV radiation based on a discharge plasma. The object of finding a novel possibility for stabilizing the source location during the generation of EUV radiation which allows changes in position of the source location to be compensated in a simple manner during the operation of the radiation source is met according to the invention in that a first beam aligning unit (7), a second beam aligning unit (4), and a beam focusing unit (5) are arranged in the vaporization beam (3) and are connected to first to third measuring devices (8, 9, 10) and can be adjusted in order to acquire and compensate for direction deviations and divergence deviations of the vaporization beam (3) with respect to reference values. |
