| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a photoresist edge burr and a method for manufacturing an array substrate.SOLUTION: A method for manufacturing an array substrate comprises the steps of: forming a gate line and a gate electrode pattern on a substrate; forming a data line, a source electrode, a drain electrode, and a TFT channel region pattern without removing a photoresist, depositing a passivation layer, and removing the remained photoresist and the passivation layer thereon by a lifting-off process; applying the photoresist, forming a peak shape edge burr on the photoresist, depositing a transparent conductive film, and forming a pixel electrode pattern which is directly connected with the drain electrode by the lifting-off process. |
