| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition mask and a film deposition apparatus in which even an extremely thin mask can have a mask body spread on a large-sized substrate without generating a wrinkle and a warp.SOLUTION: A film deposition mask is provided with: sheet-like rectangular masks (19a, 19b, and 19c); mask reinforcement plates (21, 21); a mask frame (8) which supports both ends of the rectangular masks (19a, 19b, and 19c); and a mask spreading mechanism (22) which has a pin (23) inserted into a circular through-hole (20) formed on the mask reinforcement plates (21, 21) provided at both ends of the rectangular masks (19a, 19b, and 19c), and having a peripheral surface brought into point contact with an inner peripheral surface of the through hole (20), is supported from the mask frame (8), and holds the tip of the pin (23) to the base end at a setting position where the tip is rotated in a longer direction of the mounted rectangular masks (19a, 19b, and 19c). |
