发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 A transfer transistor includes a pair of first diffusion regions and a gate electrode layer. The pair of first diffusion regions are formed in a surface of a semiconductor substrate, and are each connected to a contact. The gate electrode layer is formed on the semiconductor substrate via a gate insulating layer and has a pair of openings each surrounding the contact.
申请公布号 US2014284713(A1) 申请公布日期 2014.09.25
申请号 US201313947536 申请日期 2013.07.22
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 Kutsukake Hiroyuki;Endo Masato
分类号 H01L27/115 主分类号 H01L27/115
代理机构 代理人
主权项 1. A nonvolatile semiconductor memory device, comprising: a memory cell array configured as an arrangement of memory cells, each memory cell holding data in a nonvolatile manner; and a transfer transistor configured to transfer a certain voltage to a gate of the memory cell, the transfer transistor comprising: a pair of first diffusion regions formed in a surface of a semiconductor substrate, and each connected to a contact; and a gate electrode layer formed on the semiconductor substrate via a gate insulating layer and having a pair of openings each surrounding the contact.
地址 Minato-ku JP