发明名称 |
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE |
摘要 |
A transfer transistor includes a pair of first diffusion regions and a gate electrode layer. The pair of first diffusion regions are formed in a surface of a semiconductor substrate, and are each connected to a contact. The gate electrode layer is formed on the semiconductor substrate via a gate insulating layer and has a pair of openings each surrounding the contact. |
申请公布号 |
US2014284713(A1) |
申请公布日期 |
2014.09.25 |
申请号 |
US201313947536 |
申请日期 |
2013.07.22 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
Kutsukake Hiroyuki;Endo Masato |
分类号 |
H01L27/115 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
1. A nonvolatile semiconductor memory device, comprising:
a memory cell array configured as an arrangement of memory cells, each memory cell holding data in a nonvolatile manner; and a transfer transistor configured to transfer a certain voltage to a gate of the memory cell, the transfer transistor comprising: a pair of first diffusion regions formed in a surface of a semiconductor substrate, and each connected to a contact; and a gate electrode layer formed on the semiconductor substrate via a gate insulating layer and having a pair of openings each surrounding the contact. |
地址 |
Minato-ku JP |