| 摘要 |
Provided is a technology for the preparation of a high-precision diffraction grating, whereby a curved diffraction grating having a desired curvature can be prepared by plastically deforming, along a curved substrate, a planar diffraction grating prepared on a silicon substrate by a semiconductor process. The technology is characterized by obtaining a curved diffraction grating having a crystalline material wherein the generation of dislocation lines has been suppressed, by the silicon planar diffraction grating prepared by using a semiconductor process being transferred to a non-crystalline material, and the non-crystalline material substrate being curved and mounted to a curved fixed substrate. |
