METHOD FOR PROCESSING A SURFACE

摘要

Method and apparatus for processing a substrate (44) with an energetic particle beam (42). Features (66) on the substrate (44) are oriented relative to the energetic particle beam (42) and the substrate is scanned through the energetic particle beam (42). The substrate is periodically indexed about its azimuthal axis of symmetry (122), while shielded from exposure to the energetic particle beam (42), to reorient the features relative to the major dimension of the beam. When the substrate is shielded, the energetic particle particle beam is turned off.