发明名称 &bgr;-Ga2O3-BASED SINGLE CRYSTAL SUBSTRATE FOR GROWING Ga-CONTAINING OXIDE LAYER
摘要 PROBLEM TO BE SOLVED: To provide a &bgr;-GaO-based single crystal substrate for growing a Ga-containing oxide layer capable of heightening the quality of the Ga-containing oxide layer formed on the &bgr;-GaO-based single crystal substrate.SOLUTION: A &bgr;-GaO-based single crystal substrate for growing a Ga-containing oxide layer comprises a &bgr;-GaO-based single crystal, and has its (010) plane or a plane tilted in the angle range within 37.5° with respect to the (010) plane as a principal plane.
申请公布号 JP2014177400(A) 申请公布日期 2014.09.25
申请号 JP20140096526 申请日期 2014.05.08
申请人 TAMURA SEISAKUSHO CO LTD 发明人 SASAKI KOHEI
分类号 C30B29/16;C23C14/08;C30B29/22;H01L21/28;H01L21/338;H01L29/778;H01L29/812 主分类号 C30B29/16
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