| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive siloxane composition which is capable of forming a high-precision pattern even in a short development time while satisfying essential characteristics such as high transparency and high heat resistance, has a good development margin, and exhibits excellent adhesion to a metal substrate or the like.SOLUTION: The present invention provides the photosensitive siloxane composition which contains (a) a polysiloxane having an epoxy structure and/or an oxetane structure, (b) a naphthoquinonediazide compound, (c) a solvent, and (d) a hydroxyimide compound represented by a specific structure. The polysiloxane (a) having the epoxy structure and/or the oxetane structure is obtained by reacting a monomer containing an organosilane represented by a specific structure. |
