| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing apparatus which supplies gas from a top face side of a substrate, processes the substrate with a processing liquid, and is capable of accurately positioning a top plate part.SOLUTION: A liquid processing apparatus configured to supply gas from a top face side of a substrate and process the substrate with a processing liquid comprises: a processing vessel including an opening in its top face; a support part provided within the processing vessel for supporting and rotating the substrate; a top plate part which is provided in a vertically movable manner and faces the substrate when moving downwards; and a positioning mechanism for positioning the top plate part relatively to the processing vessel at a prescribed position when the top plate part moves downwards. The positioning mechanism includes a first positioning member fixed to the top plate part and a second positioning member fixed to the processing vessel in accordance with the first positioning member. When the top plate part moves downwards, any one of the first and second positioning members is locked to the other to determine the relative position and a fixing position of the first or second positioning member is fixed in an adjustable manner. |
