发明名称 |
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD |
摘要 |
A resist composition includes a high-molecular weight compound having a constituent unit (a0) represented by a general formula (a0-1), an acid generator component (B) which generates an acid upon exposure, and a photodegradable base (D1) which is decomposed upon exposure to lose acid diffusion controlling properties, and a mixing ratio of the component (D1) to the component (B) is 0.5 or more in terms of a molar ratio represented by (D1)/(B). In the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, an optionally substituted chain alkyl group, or an optionally substituted chain alkenyl group. |
申请公布号 |
US2014287361(A1) |
申请公布日期 |
2014.09.25 |
申请号 |
US201414218357 |
申请日期 |
2014.03.18 |
申请人 |
Tokyo Ohka Kogyo Co., Ltd. |
发明人 |
Nakamura Tsuyoshi;Tanno Kazuishi;Motoike Naoto;Komuro Yoshitaka;Hirano Tomoyuki;Arai Masatoshi |
分类号 |
G03F7/038 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
1. A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of the acid, comprising:
a base material component (A) which exhibits changed solubility in a developing solution by the action of an acid, the base material component (A) containing a high-molecular weight compound (A1) having a constituent unit (a0) represented by the following general formula (a0-1); an acid generator component (B) which generates an acid upon exposure; and a photodegradable base (D1) which is decomposed upon exposure to lose acid diffusion controlling properties, wherein a mixing ratio of the photodegradable base (D1) to the acid generator component (B) is 0.5 or more in terms of a molar ratio represented by (D1)/(B): wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, an optionally substituted chain alkyl group, or an optionally substituted chain alkenyl group. |
地址 |
Kawasaki-shi JP |