ENHANCED PRODUCTIVITY FOR AN ETCH SYSTEM THROUGH POLYMER MANAGEMENT
摘要
Embodiments described herein generally relate to an apparatus and methods for reducing the deposition of polymers in a semiconductor processing chamber. A heater jacket and heat sources are provided and may be configured to maintain a uniform temperature profile of the processing chamber. A method of maintaining a uniform temperature profile of a dielectric ceiling of the processing chamber is also provided.
申请公布号
WO2014149143(A1)
申请公布日期
2014.09.25
申请号
WO2014US10306
申请日期
2014.01.06
申请人
APPLIED MATERIALS, INC.
发明人
CHEBI, ROBERT;GRANADOS, ALFREDO;DEMONTE, PETER;CENG, ZHAO, H.;WANG, JIANQI;BALESAN, RAJAN