| 发明名称 |
ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION AND RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING THE SAME |
| 摘要 |
It is aimed to enhance adhesiveness between a resist pattern formed on a resist underlayer film and to reduce an undercut of the resist pattern. An additive for a resist underlayer film-forming composition, including: a polymer having a structural unit of Formula (1):;;(where R1 is a hydrogen atom or a methyl group; L is a divalent linking group; X is an acyloxy group having an amino group protected with a tert-butoxycarbonyl group or a nitrogen heterocycle protected with a tert-butoxycarbonyl group). |
| 申请公布号 |
US2014287589(A1) |
申请公布日期 |
2014.09.25 |
| 申请号 |
US201214352821 |
申请日期 |
2012.10.12 |
| 申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
Endo Takafumi;Sakamoto Rikimaru;Fujitani Noriaki |
| 分类号 |
H01L21/308;H01L21/027 |
主分类号 |
H01L21/308 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An additive for a resist underlayer film-forming composition, comprising:
a polymer having a structural unit of Formula (1):(where R1 is a hydrogen atom or a methyl group; L is a divalent linking group; X is an acyloxy group having an amino group protected with a tert-butoxycarbonyl group or a nitrogen heterocycle protected with a tert-butoxycarbonyl group). |
| 地址 |
Tokyo JP |
