| 摘要 |
<p>According to one embodiment, an exposure tolerance estimation method is disclosed. The method can include setting a plurality of regions (R) along a first surface (100a) of a substrate (100). The method can form a plurality of patterns (PT1a, PT1b, PT1c, PT1d, PT1e) for estimation by performing exposure on each of the regions (R) using at least three levels of exposure condition using an exposure mask (M1). The method can measure dimensions of the patterns (PT1a, PT1b, PT1c, PT1d, PT1e) for estimation and find relationships between the exposure condition and the dimensions. The method can select a first region from the regions (R). In the first region (R), a first dimension of a first pattern (PT1a, PT1b, PT1c, PT1d, PT1e) for estimation formed by exposure using a first exposure condition of an intermediate level out of the at least three levels falls within a previously set range. In addition, the method can calculate an exposure tolerance from a relationship between the first exposure condition and the first dimension.</p> |
