| 摘要 |
A plasma processing apparatus is provided to uniformly maintain plasma density by rotating an antenna positioned in an outer side wall of a chamber. A chamber(100) has a reaction space. At least one antenna part(1000) is positioned in a side wall of the chamber, and is rotated according to a circumference of the side wall. A rotating member(2000) rotates the antenna part. An antenna fixing part fixes at least one part of the antenna part. A connecting part connects a center axis part to the antenna fixing part. A housing supports the center axis part. A driving part rotates the center axis part. A plasma power source part(900) provides a plasma power source to the antenna part. |
