发明名称 METHOD AND SYSTEM USING PLASMA TUNING RODS FOR PLASMA PROCESSING
摘要 Provided is a plasma tuning rod which can be used with a microwave processing system. A wave guide includes a first dielectric part having a first external diameter. A second dielectric part having a second external diameter which is larger than the first external diameter surrounds the first dielectric part. The axis of the second dielectric part can be equal to the axis of the first dielectric part. In some embodiments of the present invention, the dielectric constant of the first dielectric part can be the same as or greater than the dielectric constant of the second dielectric part.
申请公布号 KR20140113464(A) 申请公布日期 2014.09.24
申请号 KR20140029756 申请日期 2014.03.13
申请人 TOKYO ELECTRON LIMITED 发明人 ZHAO JIANPING;VENTZEK PETER L. G.;CHEN LEE;LANE BARTON;FUNK MERRITT;SUNDARARAJAN RADHA;TOSHIHIKO IWAO;CHEN ZHIYING
分类号 H01L21/3065;H01L21/02 主分类号 H01L21/3065
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