发明名称 |
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR CONTROLLING THE SAME |
摘要 |
There is disclosed a plasma enhanced chemical vapor deposition apparatus including a pallet to load and convey an object thereon to provide a functional film to the object by plasma reaction, wherein the pallet includes a base, a jig to fix the object, and a fixing part disposed on the base at an upper side of the fixing part Lo fix the object to the pallet. |
申请公布号 |
EP2689049(A4) |
申请公布日期 |
2014.09.24 |
申请号 |
EP20120765453 |
申请日期 |
2012.03.16 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
OH, JUNGGEUN;LEE, KWANGHO;LEE, JANGWOO;KIM, JEONGGYU;SHIN, JINHYOUK |
分类号 |
C23C16/50;C23C16/02;C23C16/44;C23C16/458;C23C16/513;C23C16/54;H01J37/32 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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