| 摘要 |
<p>The invention relates to a process for the manufacture of a hydrophobic glazing comprising the following successive stages: (a) formation of a carbon-rich silicon oxycarbide (SiOxCy) layer at the surface of a substrate made of mineral glass by chemical vapor deposition (CVD) over at least a portion of the surface of said substrate by bringing said surface into contact with a stream of reactive gases comprising ethylene (C2H4), silane (SiH4) and carbon dioxide (CO2) at a temperature of between 600° C. and 680° C., the ethylene/silane (C2H4/SiH4) ratio by volume during stage (a) being less than or equal to 3.3, (b) formation of an SiO2 layer on the silicon oxycarbide layer deposited in stage (a) or (b′) formation of a carbon-poor silicon oxycarbide layer exhibiting a mean C/Si ratio of less than 0.2, (c) annealing and/or shaping the substrate obtained on conclusion of stage (b) or (b′) at a temperature of between 580° C. and 700° C., (d) activation of the silica layer, formed in stage (b), or of the silicon oxycarbide layer, formed in stage (b′), by plasma treatment or acidic or basic chemical treatment, and (e) grafting, by covalent bonding, a fluorinated hydrophobic agent. It also relates to a hydrophobic glazing, preferably a windshield, capable of being obtained by such a process.</p> |
