发明名称 Electron beam data storage system and method for high volume manufacturing
摘要 The present disclosure provides for many different embodiments of a charged particle beam data storage system and method. In an example, a method includes dividing a design layout into a plurality of units; creating a lookup table that maps each of the plurality of units to its position within the design layout and a data set, wherein the lookup table associates any repeating units in the plurality of units to a same data set; and exposing an energy sensitive layer to a charged particle beam based on the lookup table.
申请公布号 US8841049(B2) 申请公布日期 2014.09.23
申请号 US201313964974 申请日期 2013.08.12
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Wang Hung-Chun;Chen Pei-Shiang;Lin Tzu-Chin;Krecinic Faruk;Chen Jeng-Horng;Huang Wen-Chun;Liu Ru-Gun
分类号 G03F1/20;G06F17/50;H01J37/317;G03F1/36;G03F7/20;H01J37/302 主分类号 G03F1/20
代理机构 Haynes and Boone, LLP 代理人 Haynes and Boone, LLP
主权项 1. A method comprising: receiving a design layout having a first pattern and a second pattern, wherein the second pattern is a repeating pattern of the first pattern; reducing a data size of the design layout, wherein the reducing includes: creating a lookup table corresponding to the design layout using a computing system, wherein the lookup table maps the first pattern and the second pattern to a same data set based on the second pattern being a repeating pattern of the first pattern.
地址 Hsin-Chu TW