发明名称 |
Electron beam data storage system and method for high volume manufacturing |
摘要 |
The present disclosure provides for many different embodiments of a charged particle beam data storage system and method. In an example, a method includes dividing a design layout into a plurality of units; creating a lookup table that maps each of the plurality of units to its position within the design layout and a data set, wherein the lookup table associates any repeating units in the plurality of units to a same data set; and exposing an energy sensitive layer to a charged particle beam based on the lookup table. |
申请公布号 |
US8841049(B2) |
申请公布日期 |
2014.09.23 |
申请号 |
US201313964974 |
申请日期 |
2013.08.12 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Wang Hung-Chun;Chen Pei-Shiang;Lin Tzu-Chin;Krecinic Faruk;Chen Jeng-Horng;Huang Wen-Chun;Liu Ru-Gun |
分类号 |
G03F1/20;G06F17/50;H01J37/317;G03F1/36;G03F7/20;H01J37/302 |
主分类号 |
G03F1/20 |
代理机构 |
Haynes and Boone, LLP |
代理人 |
Haynes and Boone, LLP |
主权项 |
1. A method comprising:
receiving a design layout having a first pattern and a second pattern, wherein the second pattern is a repeating pattern of the first pattern; reducing a data size of the design layout, wherein the reducing includes:
creating a lookup table corresponding to the design layout using a computing system, wherein the lookup table maps the first pattern and the second pattern to a same data set based on the second pattern being a repeating pattern of the first pattern. |
地址 |
Hsin-Chu TW |