| 摘要 |
<p>Disclosed are systems and methods for compensating for harmonics produced during plasma processing in a plasma chamber. One method includes the step of retrieving a measurement of a combined waveform. The combined waveform includes a fundamental waveform and a harmonic waveform. The combined waveform defines a voltage near the surface of a chuck. The chuck is coupled to a radio frequency (RF) transmission line. The RF transmission line is coupled to an impedance matching circuit. The impedance matching circuit is coupled to an RF generator. The method further includes the steps of: extracting the fundamental waveform from the combined waveform; determining a difference between the magnitude of the combined waveform and the magnitude of the fundamental waveform; and controlling the RF generator to compensate for the difference.</p> |
