| 摘要 |
PURPOSE: A substrate processing apparatus is provided to improve throughput by spreading process liquid to substrates and drying the substrates at the same time. CONSTITUTION: A substrate receiving unit(1) accepts a substrate(9) from the outside. A spreading unit(2) sprays processing liquid to the substrate. A drying unit(3) dries the substrate. A substrate discharging unit(4) discharges the substrate to the outside. A transferring unit(5) moves substrates from the substrate receiving unit to the spreading unit at the same time. |
