发明名称 |
Methods of forming three dimensionally integrated semiconductor systems including photoactive devices and semiconductor-on-insulator substrates |
摘要 |
Three dimensionally integrated semiconductor systems include a photoactive device operationally coupled with a current/voltage converter on a semiconductor-on-insulator (SeOI) substrate. An optical interconnect is operatively coupled to the photoactive device. A semiconductor device is bonded over the SeOI substrate, and an electrical pathway extends between the current/voltage converter and the semiconductor device bonded over the SeOI substrate. Methods of forming such systems include forming a photoactive device on an SeOI substrate, and operatively coupling a waveguide with the photoactive device. A current/voltage converter may be formed over the SeOI substrate, and the photoactive device and the current/voltage converter may be operatively coupled with one another. A semiconductor device may be bonded over the SeOI substrate and operatively coupled with the current/voltage converter. |
申请公布号 |
US8842945(B2) |
申请公布日期 |
2014.09.23 |
申请号 |
US201113206299 |
申请日期 |
2011.08.09 |
申请人 |
Soitec |
发明人 |
Nguyen Bich-Yen;Sadaka Mariam |
分类号 |
G02B6/12;H01L25/16;H01L27/06;H01L31/103 |
主分类号 |
G02B6/12 |
代理机构 |
TraskBritt |
代理人 |
TraskBritt |
主权项 |
1. A method of fabricating a three dimensionally integrated semiconductor system, comprising:
providing a semiconductor-on-insulator (SeOI) substrate comprising a layer of semiconductor material and a layer of electrically insulating material disposed adjacent a major surface of the layer of semiconductor material; forming at least one photoactive device on the layer of semiconductor material of the SeOI substrate; forming at least one waveguide comprising a portion of the layer of semiconductor material of the SeOI substrate, and operatively coupling the at least one waveguide with the at least one photoactive device; forming at least one current/voltage converter over the layer of semiconductor material of the SeOI substrate; electrically coupling the at least one photoactive device and the at least one current/voltage converter; bonding at least one semiconductor device over the SeOI substrate by a direct bonding process at a temperature of 500° C. or less, wherein the at least one semiconductor device and the at least one photoactive device are disposed on opposing sides of the layer of electrically insulating material of the SeOI substrate; and electrically coupling the at least one current/voltage converter and the at least one semiconductor device bonded over the SeOI substrate. |
地址 |
Bernin FR |