发明名称 Method for making light emitting diode
摘要 A method for making light emitting diode includes following steps. A substrate having an epitaxial growth surface is provided. A first semiconductor layer, an active layer, and a second semiconductor layer is epitaxially grown on the epitaxial growth surface of the substrate in that sequence. A first optical symmetric layer is formed on the second semiconductor layer. A metallic layer is applied on the first optical symmetric layer. A second optical symmetric layer is formed on the metallic layer. The substrate is removed. A first electrode is configured to cover entire exposed surface of the first semiconductor layer. A second electrode is electrically connected to the second semiconductor layer.
申请公布号 US8841148(B2) 申请公布日期 2014.09.23
申请号 US201213729554 申请日期 2012.12.28
申请人 Tsinghua University;Hon Hai Precision Industry Co., Ltd. 发明人 Zhu Jun;Zhang Hao-Su;Zhu Zhen-Dong;Li Qun-Qing;Jin Guo-Fan;Fan Shou-Shan
分类号 H01L21/00;H01L33/00;H01L33/46;H01L33/24 主分类号 H01L21/00
代理机构 Novak Druce Connolly Bove + Quigg LLP 代理人 Novak Druce Connolly Bove + Quigg LLP
主权项 1. A method for making light emitting diode, the method comprising: providing a substrate having an epitaxial growth surface; epitaxially growing a first semiconductor layer, an active layer, and a second semiconductor layer on the epitaxial growth surface of the substrate in that sequence; forming a first optical symmetric layer on the second semiconductor layer; applying a metallic layer on the first optical symmetric layer; forming a second optical symmetric layer on the metallic layer; exposing a surface of the first semiconductor layer by removing the substrate to form an exposed surface; applying a first electrode covering the entire exposed surface of the first semiconductor layer; and applying a second electrode electrically connected to the second semiconductor layer.
地址 Beijing CN