Self-adjusting gate hard mask

摘要

An intermediate wafer includes a substrate having a surface and a first dummy gate plug disposed upon a structure, e.g., a FIN, supported by the substrate surface; a second dummy gate plug disposed upon the substrate surface; and a first layer in which the first dummy gate plug and the second dummy gate plug are embedded. The first layer exhibits a non-planar surface topography characterized by a depression due at least to a presence of the first dummy gate plug. The structure further includes a second layer that fills the depression to the surface of the first layer, and a third layer that overlies the first layer and the second layer. The third layer is formed of a hard mask material and has a substantially planar surface topography over the first and second dummy gate plugs and over the depression that is filled with the material of the second layer.

主权项

1. An intermediate wafer comprising:
a substrate having a dielectric layer disposed thereon, the dielectric layer having a surface upon which a structure is disposed, the structure comprised of a fin formed from a patterned portion of a silicon on insulator (SOI) layer that is disposed upon and in contact with the surface of the dielectric layer, the fin having a top surface disposed at a height (h) above the surface of the dielectric layer; a first dummy gate plug disposed upon the top surface of the fin; a second dummy gate plug disposed upon the surface of the dielectric layer, where a top surface of the first dummy gate plug is disposed above a top surface of the second dummy gate plug by at least the height (h); a first layer in which the first dummy gate plug and the second dummy gate plug are embedded, the first layer having a surface exhibiting a non-planar surface topography characterized by a depression due at least to a presence of the first dummy gate plug that is disposed upon the top surface of the fin; a second layer comprised of a material that fills the depression in the surface of the first layer, the second layer having a first surface in contact with the surface of the first layer only within the depression, the second layer having a second surface that is substantially coplanar with the surface of the first layer; and a third layer overlying and in contact with the surface of the first layer and in contact with the second surface of the second layer, the third layer being comprised of a hard mask material, the third layer having a substantially planar surface topography over the first dummy gate plug, over the second dummy gate plug, and over the depression that is filled with the material of the second layer.